新世纪光刻技术及光刻设备的发展趋势

摘要

本文主要阐述了光刻技术的发展极限及193nm、157nm光学光刻技术和电子束投影光刻(SCALPEL)、X-射线光刻(XRL)离子投影光刻(IPL)等技术的发展趋势。并详细介绍了国际著名品牌的光刻机以及即将推出的新一代光刻机。对国内光刻设备的发展现状作了简要概述。%The limitation of photolithography technology and the trend of 193nm,157nm photolithography technology,SCALPEL,x-ray photolithography,and IPL are analyzed in the article.The international brand-named photolithography equipmemt and the ready-to-ship new generation of photolithography equipment are also introduced,and the current status of domestic photolithography equipmemt is briefly mentioned.