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Kinetics of PVDF film degradation under electron bombardment

机译:电子轰击下PVDF薄膜降解的动力学

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A dose effect of high-energy (20 keV) electron irradiation on the chemical composition of PVDF films has been revealed using a scanning electron microscope Jeol JSM-7001F equipped with an X-ray fluorescence spectrometer Oxford INCA X-max 80. All the experimental series have demonstrated similar decreasing dependence of relative atomic fluorine content (F/C) upon the electron irradiation dose. The final nonzero F/C ratio can be explained in terms of primary defects in the original PVDF and secondary ones arising during irradiation. In general a defluorination process is consistent to a Le Moel model of PVDF degradation and can be satisfactorily described with a third-order kinetic equation, parameters of which depend on the type of a PVDF film.
机译:使用配备有X射线荧光光谱仪Oxford Oxford INCA X-max 80的扫描电子显微镜Jeol JSM-7001F,已经揭示了高能(20 keV)电子辐射对PVDF膜化学成分的剂量效应。所有实验该系列已证明相对原子氟含量(F / C)对电子辐照剂量具有相似的下降依赖性。最终的非零F / C比可以用原始PVDF中的主要缺陷和辐照期间产生的次要缺陷来解释。通常,脱氟过程与PVDF降解的Le Moel模型一致,并且可以用三阶动力学方程令人满意地描述,该方程的参数取决于PVDF膜的类型。

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