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Self-Consistent 2-D Kinetic Simulations of High-Voltage Plasma Sheaths Surrounding Ion-Attracting Conductive Cylinders in Flowing Plasmas

机译:高压等离子体鞘围绕流动等离子体中吸引离子的导电圆筒的自洽二维动力学模拟

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Using the self-consistent steady-state 2-D Kinetic Plasma Solver (KIPS-2D), thorough characterizations are performed of high-voltage cylindrical sheaths surrounding ion-attracting conductive cylinders immersed in stationary as well as flowing collisionless plasmas. Analytical fits are obtained that allow for the accurate prediction of stationary sheath sizes for round-cylinder radii anywhere from one thousandth of a Debye length to five Debye lengths and for any bias potential beyond a small lower bound. Plasma flow is shown to progressively compress the sheath on its ram and lateral sides, down to a limit that closely matches the stationary frozen-ion sheath radius. Conversely, plasma flow is shown to cause a significant wake-side elongation of the sheath. The quasi-elliptical sheath-edge contours observed under flowing conditions can be characterized by their along-flow and across-flow dimensions. By normalizing these dimensions against stationary-sheath diameters, contour plots of the corresponding flow-effect correction factors can be obtained that account for plasma-flow velocity effects in a wide range of speed regimes and bias potentials. In this paper, Mach numbers up to ten and bias potentials from -10Te to -500Te (where Te is the electron temperature in units of volts) are simulated and corresponding correction factors are computed, although KiPS is capable of simulating even higher speeds and bias potentials. These correction factors appear to stabilize at high voltages, suggesting that their values at the highest simulated potential bias possibly can be used with reasonable accuracy to predict performance at even higher (but nonrelativistic) bias-potential values using analytical equations derived from stationary simulations. For example, at a Mach number of 1.1, the along-flow and across-flow sheath dimensions at high voltages are expected to be around 115% and 85% of the stationary-sheath diameter, respectively. Flow-ef-fect correction factors for current collection are also obtained for the ram-side, wake-side, and total collected current. For the same plasma-velocity example, at high voltages, total current collection is minimized to about half of the stationary value, which would translate into a 50% reduction in power to collect the current. This example is of significance for Earth-radiation-belt remediation-system concepts using high-voltage tethers
机译:使用自洽的稳态二维动力学等离子体解算器(KIPS-2D),对浸没在静止和流动的无碰撞等离子体中的离子吸引导电圆柱体周围的高压圆柱形护套进行了全面的表征。获得的分析拟合可以精确预测圆形圆柱半径的固定鞘管尺寸,范围从德比长度的千分之五到德比长度的五分之一,以及任何可能超出较小下限的偏斜。血浆流显示可在其柱塞和侧面逐渐压缩护套,直至达到与固定冷冻离子护套半径紧密匹配的极限。相反,等离子体流显示出显着的鞘的尾流侧伸长。在流动条件下观察到的准椭圆形鞘缘轮廓可以通过其沿流和跨流尺寸来表征。通过将这些尺寸相对于固定鞘管直径进行归一化,可以获得相应的流量效应校正因子的等高线图,这些等值线图考虑了在广泛的速度范围和偏置电势下的等离子体流速效应。在本文中,尽管KiPS能够模拟甚至更高的速度和偏置,但仍可模拟高达10的马赫数和从-10Te到-500Te的偏置电势(其中Te是以伏特为单位的电子温度),并且计算了相应的校正因子。潜力。这些校正因子似乎在高电压下稳定,这表明可以使用从静态模拟得出的解析方程,以最高的模拟电位偏置值正确地使用它们的值来预测甚至更高(但相对论)的偏置电位值下的性能。例如,在马赫数为1.1的情况下,高压下的顺流和顺流护套尺寸预计分别约为固定鞘管直径的115%和85%。还获得了冲头侧,尾流侧和总收集电流的电流收集的流效应校正因子。对于相同的等离子速度示例,在高电压下,总电流收集被最小化到固定值的一半左右,这将转化为收集电流的功率降低了50%。该示例对于使用高压束线的地球辐射带修复系统概念具有重要意义

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