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Electrostatic Plasma Lens Focusing of an Intense Electron Beam in an Electron Source With a Vacuum Arc Plasma Cathode

机译:带有真空电弧等离子体阴极的电子源中强电子束的静电等离子体透镜聚焦

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In this paper, we present the research results on focusing and transport of an intense (up to 100 A) nonrelativistic (up to 20 kV) pulsed electron beam using an axially symmetric device with a high-current plasma lens configuration. The electron source is based on electron extraction from the plasma of a hollow-anode vacuum arc discharge. The arc is initiated by a dielectric surface flashover. The emission hole is covered with a fine mesh grid. The beam is extracted and accelerated in a diode-type electro-optical system formed between the grid surface and an open anode plasma boundary. The anode plasma is produced in an electron beam transport channel through residual gas ionization by beam electrons and a plasma lens discharge. The plasma lens configuration of crossed electric and magnetic fields provides an attractive means to obtain a stable low-pressure plasma discharge. This geometry allows the compression of the electron beam in diameter from 6 to 1 cm with more than 100-${rm A}/{rm cm}^{2}$ beam current density at the collector.
机译:在本文中,我们使用具有高电流等离子透镜配置的轴对称设备,对强(高达100 A)相对论(高达20 kV)非相对论(高达20 kV)脉冲电子束的聚焦和传输进行了研究。电子源基于从空心阳极真空电弧放电的等离子体中提取的电子。电弧是由电介质表面闪络引发的。发射孔被细网格覆盖。在形成于栅极表面和阳极阳极等离子体边界之间的二极管型光电系统中,光束被提取并加速。阳极等离子体在电子束传输通道中通过束状电子的残留气体电离和等离子透镜放电在电子束传输通道中产生。交叉电场和磁场的等离子透镜配置为获得稳定的低压等离子放电提供了一种有吸引力的手段。这种几何形状允许将电子束的直径从6压缩到1 cm,并具有超过100- <公式:type =“ inline”> $ {rm A} / {rm cm} ^ {2 } $ 收集器处的束电流密度。

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