Pulsed Cathodic Arc for Forevacuum-Pressure Plasma-Cathode Electron Sources

摘要

We describe properties and parameters of a pulsed cathodic arc discharge, as applied in forevacuum-pressure plasma-cathode electron sources for the generation of broad electron beams. It is shown that during a single arc current pulse, the arc can operate in either of two modes, differing in their discharge operating voltage and plasma constitution. The radial plasma density distribution approximates a Gaussian. The effect of gas pressure on the plasma density is pronounced only at a considerable distance from the cathode.