首页> 外文期刊>IEEE Transactions on Plasma Science >Efficiency Enhancement of PIC-MCC Modeling for Magnetron Sputtering Simulations Using GPU Parallelization
【24h】

Efficiency Enhancement of PIC-MCC Modeling for Magnetron Sputtering Simulations Using GPU Parallelization

机译:使用GPU并行化进行磁控溅射仿真的PIC-MCC建模效率提高

获取原文
获取原文并翻译 | 示例

摘要

A particle-in-cell Monte Carlo collision (PIC-MCC) model is presented, parallelized to be suitable for magnetron sputtering simulations on general purpose graphics processing units (GPGPUs). To reduce the large computation time generally required to calculate particle-electromagnetic field interactions, a numerical algorithm is optimized to obtain the best performance with GPGPU parallelization. The efficiency and accuracy of the GPGPU parallelized PIC-MCC model are examined by comparing the calculated results and the corresponding computational time with analytical solutions and the computation time of the serial code, respectively. The erosion and deposition rates during sputtering predicted using this model are in good agreement with experimental results. The newly developed PIC-MCC model with GPGPU parallelization is thereby shown to be both efficient and accurate.
机译:提出了单元格内蒙特卡洛碰撞(PIC-MCC)模型,该模型并行化以适合在通用图形处理单元(GPGPU)上进行磁控溅射仿真。为了减少计算粒子与电磁场相互作用通常所需的大量计算时间,对数值算法进行了优化,以获得GPGPU并行化的最佳性能。通过将计算结果和相应的计算时间分别与解析解和串行代码的计算时间进行比较,来检验GPGPU并行化PIC-MCC模型的效率和准确性。使用该模型预测的溅射过程中的腐蚀和沉积速率与实验结果非常吻合。由此证明,新开发的具有GPGPU并行化功能的PIC-MCC模型既高效又准确。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号