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机译:热界面电阻对磁隧道结热电阻的影响
International Iberian Nanotechnology Laboratory (INL) Av. Mestre Jose Veiga s Braga 4715-330 Portugal;
Centro Brasileiro de Pesquisas Fisicas (CBPF) Rua Dr. Xavier Sigaud 150 Rio de Janeiro 22290-180 Brazil;
Centro Brasileiro de Pesquisas Fisicas (CBPF) Rua Dr. Xavier Sigaud 150 Rio de Janeiro 22290-180 Brazil;
International Iberian Nanotechnology Laboratory (INL) Av. Mestre Jose Veiga s Braga 4715-330 Portugal;
International Iberian Nanotechnology Laboratory (INL) Av. Mestre Jose Veiga s Braga 4715-330 Portugal;
International Iberian Nanotechnology Laboratory (INL) Av. Mestre Jose Veiga s Braga 4715-330 Portugal;
International Iberian Nanotechnology Laboratory (INL) Av. Mestre Jose Veiga s Braga 4715-330 Portugal;
机译:热界面电阻对磁性隧道结的热电压的影响
机译:热界面电阻对磁隧道结热电阻的影响
机译:MgAl_2O_4和MgO势垒厚度的变化增强基于CoFeB的磁性隧道结中的热电压和隧道磁塞贝克效应
机译:高热电阻覆盖层在磁隧道结中提高磁各向异性的电控制
机译:磁性隧道结中新型铁磁材料和铁磁体/氧化物界面的高级电子显微镜。
机译:CoRhMnGe基磁性隧道结中界面改性的极大非平衡隧道磁阻比
机译:增强CoFeB中的热电压和隧道磁塞贝克效应 基于mgal $ _2 $ O $ _4 $和mgO的变化的磁隧道结 屏障厚度