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Extremely Large Non-equilibrium Tunnel Magnetoresistance Ratio in CoRhMnGe Based Magnetic Tunnel Junction by Interface Modification

机译:CoRhMnGe基磁性隧道结中界面改性的极大非平衡隧道磁阻比

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摘要

Equiatomic quaternary Heusler compounds (EQHCs) generally have the advantages of high Curie temperature, large spin polarization and long spin diffusion length, and they are regarded as one of the most promising candidates for spintronics devices. Herein, we report a theoretical investigation on an EQHC CoRhMnGe based magnetic tunnel junction (MTJ) with (i) MnGe-terminated interface and (ii) modified pure Mn terminated interface, i.e., MnMn-terminated interface. By employing first principle calculations combined with non-equilibrium Green's function, the local density of states (LDOS), transmission coefficient, spin-polarized current, tunnel magnetoresistance (TMR) ratio and spin injection efficiency (SIE) as a function of bias voltage are studied. It reveals that when the MTJ under equilibrium state, TMR ratio of MnGe-terminated structure is as high as 3,438%. When the MTJ is modified to MnMn-terminated interface, TMR ratio at equilibrium is enhanced to 2 × 105%, and spin filtering effects are also strengthened. When bias voltage is applied to the MTJ, the TMR ratio of the MnGe-terminated structure suffers a dramatic loss. While the modified MnMn-terminated structure could preserve a large TMR value of 1 × 105%, even bias voltage rises up to 0.1 V, showing a robust bias endurance. These excellent spin transport properties make the CoRhMnGe a promising candidate material for spintronics devices.
机译:等原子四元Heusler化合物(EQHC)通常具有居里温度高,自旋极化大和自旋扩散长度长的优点,被认为是自旋电子学器件最有希望的候选者之一。本文中,我们报告了基于EQHC CoRhMnGe的磁性隧道结(MTJ)的理论研究,该结具有(i)MnGe端接的界面和(ii)修饰的纯Mn端接的界面,即MnMn端接的界面。通过将第一原理计算与非平衡格林函数相结合,可以得出局部局部状态密度(LDOS),传输系数,自旋极化电流,隧道磁阻(TMR)比和自旋注入效率(SIE)作为偏置电压的函数。研究。结果表明,当MTJ处于平衡状态时,MnGe端基结构的TMR比高达3438%。将MTJ修饰为MnMn端接界面时,平衡时的TMR比提高到2×10 5 %,自旋过滤效果也得到增强。当将偏置电压施加到MTJ时,以MnGe为末端的结构的TMR比会遭受极大的损失。尽管修饰的MnMn端基结构可以保留1×10 5 %的大TMR值,但即使偏置电压上升到0.1 V,也显示出强大的偏置耐久性。这些出色的自旋传输性能使CoRhMnGe成为自旋电子器件的有前途的候选材料。

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