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Graphene/SiC(0001) interface structures induced by Si intercalation and their influence on electronic properties of graphene

机译:Si插层诱导的石墨烯/ SiC(0001)界面结构及其对石墨烯电子性能的影响

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摘要

Epitaxial graphene growth on SiC surfaces is considered advantageous in terms of device application. However, the first graphitic layer on SiC transforms to a buffer layer because of strong coupling with the substrate. The properties of several subsequent layers are also significantly degraded. One method to decouple graphene from the substrate is Si intercalation. In the present work, we report observation and analysis of interface structures formed by Si intercalation in between the graphene layer and the SiC(0001) surface depending on Si coverage and influence of these interfaces on graphene electronic structure by means of low-energy electron diffraction (LEED), scanning tunneling microscopy (STM), angle-resolved photoemission spectroscopy (ARPES), and theoretical first-principles calculations. The STM appearance of observed periodic interface structures strongly resembles previously known Si-rich phases on the SiC(0001) surface. Based on the observed range of interface structures we discuss the mechanism of graphene layer decoupling and differences in stability of the Si-rich phases on clean SiC(0001) and in the graphene/SiC(0001) interface region. We also discuss a possibility to tune graphene electronic properties by interface engineering.
机译:就器件应用而言,SiC表面上外延石墨烯的生长被认为是有利的。然而,由于与衬底的牢固耦合,SiC上的第一石墨层转变为缓冲层。几个随后的层的性能也大大降低。将石墨烯与衬底解耦的一种方法是Si嵌入。在当前的工作中,我们报告观察和分析由石墨烯层和SiC(0001)表面之间的硅插层形成的界面结构,该界面结构取决于硅的覆盖率以及这些界面通过低能电子衍射对石墨烯电子结构的影响(LEED),扫描隧道显微镜(STM),角度分辨光发射光谱(ARPES)和理论第一原理计算。观察到的周期性界面结构的STM外观非常类似于SiC(0001)表面上先前已知的富硅相。基于观察到的界面结构范围,我们讨论了石墨烯层解耦的机理以及干净SiC(0001)和石墨烯/ SiC(0001)界面区域上富Si相的稳定性差异。我们还将讨论通过界面工程调整石墨烯电子性能的可能性。

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  • 来源
    《Physical Review. B, Condensed Matter》 |2016年第24期|245421.1-245421.10|共10页
  • 作者单位

    Department of Applied Quantum Physics and Nuclear Engineering, Kyushu University, Fukuoka 819-0395, Japan;

    Department of Applied Quantum Physics and Nuclear Engineering, Kyushu University, Fukuoka 819-0395, Japan;

    Department of Applied Quantum Physics and Nuclear Engineering, Kyushu University, Fukuoka 819-0395, Japan;

    Toyota Technological Institute, Nagoya 468-8511, Japan;

    Institute of Solid State Physics, University of Tokyo, Kashiwa 277-8581, Japan;

    Institute of Solid State Physics, University of Tokyo, Kashiwa 277-8581, Japan;

    Department of Applied Quantum Physics and Nuclear Engineering, Kyushu University, Fukuoka 819-0395, Japan;

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