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Planar heterostructures of single-layer transition metal dichalcogenides: Composite structures, Schottky junctions, tunneling barriers, and half metals

机译:单层过渡金属二硫化氢的平面异质结构:复合结构,肖特基结,隧穿势垒和半金属

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Planar composite structures formed from the stripes of transition metal dichalcogenides joined commensurately along their zigzag or armchair edges can attain different states in a two-dimensional (2D), single-layer, such as a half metal, 2D or one-dimensional (ID) nonmagnetic metal and semiconductor. Widening of stripes induces metal-insulator transition through the confinements of electronic states to adjacent stripes, that results in the metal-semiconductor junction with a well-defined band lineup. Linear bending of the band edges of the semiconductor to form a Schottky barrier at the boundary between the metal and semiconductor is revealed. Unexpectedly, strictly ID metallic states develop in a 2D system along the boundaries between stripes, which pins the Fermi level. Through the <5 doping of a narrow metallic stripe one attains a nanowire in the 2D semiconducting sheet or narrow band semiconductor. A diverse combination of constituent stripes in either periodically repeating or finite-size heterostructures can acquire critical fundamental features and offer device capacities, such as Schottky junctions, nanocapacitors, resonant tunneling double barriers, and spin valves. These predictions are obtained from first-principles calculations performed in the framework of density functional theory.
机译:由过渡金属二硫化碳的条纹沿锯齿形或扶手椅形边缘相应连接而成的平面复合结构可以在二维(2D)单层(例如半金属,2D或一维(ID))中获得不同的状态非磁性金属和半导体。条纹的加宽通过将电子状态限制到相邻的条纹来诱导金属-绝缘体过渡,从而导致金属-半导体结具有明确定义的能带排列。揭示了半导体的能带边缘的线性弯曲,以在金属和半导体之间的边界处形成肖特基势垒。出乎意料的是,严格ID的金属态沿着条纹之间的边界在2D系统中发展,从而固定了费米能级。通过小于5的窄金属条掺杂,可以在2D半导体片或窄带半导体中获得纳米线。周期性重复或有限尺寸的异质结构中组成条带的各种组合可以获得关键的基本特征并提供器件容量,例如肖特基结,纳米电容器,共振隧穿双势垒和自旋阀。这些预测是从在密度泛函理论框架内进行的第一性原理计算中获得的。

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