机译:电路电边界条件下的外延Pb(Zr,Ti)O_3超薄膜
Physics Department, Augusta Technical College, Augusta, Georgia, 30906, USA;
Institute for Nanoscience and Engineering and Physics Department, University of Arkansas, Fayetteville, Arkansas 72701, USA;
thin film structure and morphology; polarization and depolarization;
机译:无应力和开路电边界条件下Pb(Zr,Ti)O_3超薄膜的性能
机译:外延Pb(Zr,Ti)O_3厚膜的电学性质对晶体取向和Zr /(Zr + Ti)比的影响
机译:改善溅射PB_(1.10)的电性能(Zr_(0.52),Ti_(0.48))O_3 / PB_(1.25)(Zr_(0.52),Ti_(0.48))O_3多层薄膜
机译:溅射生长Pb(Zr_x,Ti_(1-x))O_3外延膜中的Morphotopic相边界的研究
机译:压电瘤应用Pb(Zr0.3Ti0.7)O3薄膜对缩放效应对缩放效应的影响
机译:硅上外延PbZr0.45Ti0.55O3薄膜的铁电和压电特性的固有稳定性与晶粒倾斜的关系
机译:无应力和开路电边界条件下Pb(Zr,Ti)O3超薄膜的性能
机译:通过mOCVD和射频溅射制备的外延pb(Zr(sub 0.40)Ti(sub 0.60))O(sub 3)/ srRuO(sub 3)和pbTiO(sub 3)/ srRuO(sub 3)多层薄膜