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The Role of Carbon Doping on Breakdown, Current Collapse, and Dynamic On-Resistance Recovery in AlGaN/ GaN High Electron Mobility Transistors on Semi-Insulating SiC Substrates

机译:在半绝缘SiC衬底上的AlGaN / GaN高电子迁移率晶体管中,碳掺杂对击穿,电流崩塌和动态导通电阻恢复的作用

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摘要

Herein, the critical role of carbon doping in the electrical behavior of AlGaN/GaN high electron mobility transistors (HEMTs) on semi-insulating SiC substrates is assessed by investigating the off-state three-terminal breakdown, current collapse, and dynamic on-resistance recovery at high drain–source voltages. Extensive device simulations of typical GaN HEMT structures are conducted and compared with experimental data from published, state-of-the-art technologies to 1) explain the slope of the breakdown voltage as a function of the gate-to-drain spacing lower than GaN critical electric field as a result of the nonuniform electrical field distribution in the gate–drain access region; 2) attribute the drain current collapse to trapping in deep acceptor states in the buffer associated with carbon doping; and 3) interpret the partial dynamic on-resistance recovery after off-state stress at high drain–source voltages as a consequence of hole generation and trapping.
机译:在此,通过研究截止状态的三端击穿,电流崩塌和动态导通电阻来评估碳掺杂在半绝缘SiC衬底上的AlGaN / GaN高电子迁移率晶体管(HEMT)的电性能中的关键作用在高漏源电压下恢复。进行了典型GaN HEMT结构的广泛器件仿真,并与已发布的最新技术的实验数据进行了比较:1)解释了击穿电压的斜率是低于GaN的栅漏间距的函数由于栅漏通道区域内电场分布不均匀而产生的临界电场; 2)将漏极电流崩溃归因于与碳掺杂相关的缓冲层中深受主态的捕获;和3)解释由于空穴产生和陷获而在高漏源电压下处于断态应力后的局部动态导通电阻恢复。

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