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Interfacial roughness of Fe_3Si/ GaAs(001) films studied by X-ray crystal truncation rods

机译:X射线晶体截断棒研究Fe_3Si / GaAs(001)薄膜的界面粗糙度

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Crystal truncation rods (CTRs) from thin Fe-3Si films grown on GaAs(001) by molecular beam epitaxy (MBE) are measured at different stages of deposition. The films do not develop their own surface roughness but are conforrnal to the substrate, so thai the substrate roughness governs the whole system. A factor that describes the roughness ol' a zinc blende structurernin the β model of terrace height probabilities is derived and applied to describe the experimental curves. We show that the β model adequately describes the CTRs while the model of continuous Gaussian fluctuations of the surface height notably underestimates the root-mean-squared (rms) roughness.
机译:在沉积的不同阶段测量了通过分子束外延(MBE)在GaAs(001)上生长的Fe-3Si薄膜形成的晶体截断棒(CTR)。薄膜不会形成自己的表面粗糙度,而是与基材共形,因此基材粗糙度决定了整个系统。得出了描述梯田高度概率的β模型中锌混合结构的粗糙度的因素,并将其应用于描述实验曲线。我们表明,β模型足以描述CTR,而表面高度的连续高斯波动模型则明显低估了均方根(rms)粗糙度。

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