机译:PVP /并五苯薄膜的沉积后退火对有机薄膜晶体管特性的影响
School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea;
School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea;
School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea;
School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea;
annealing; electrical properties; organic films; structure; thin-film transistors;
机译:沉积后真空退火对p型Cu_2O薄膜特性的影响及其对薄膜晶体管特性的影响
机译:有和没有退火的可溶性6,13-双(三异丙基-甲硅烷基乙炔基)-并五苯类有机薄膜晶体管的光响应特性和磁滞
机译:有和没有退火的可溶性6,13-双(三异丙基-甲硅烷基乙炔基)-并五苯类有机薄膜晶体管的光响应特性和磁滞
机译:沉积后退火对氧化铌薄膜结构和光学特性的影响
机译:应用于薄膜晶体管的硅薄膜的脉冲激光退火。
机译:F4TCNQ掺杂的并五苯中间层对基于顶部接触并五苯的有机薄膜晶体管性能改善的影响
机译:沉积后真空退火对p型Cu $ _ {2} $ O薄膜特性的影响及其对薄膜晶体管特性的影响