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首页> 外文期刊>Physica status solidi >Improved charge carrier mobility in copper phthalocyanine based field effect transistors by insertion of a thin poorly conducting layer as gate insulator extension
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Improved charge carrier mobility in copper phthalocyanine based field effect transistors by insertion of a thin poorly conducting layer as gate insulator extension

机译:通过插入薄的不良导电层作为栅极绝缘体延伸层,改善了基于铜酞菁的场效应晶体管中的电荷载流子迁移率

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摘要

The charge carrier mobility is an important parameter that directly affects the performance of organic field-effect transistors. We use copper phthalocyanine (CuPc)-based transistors having crosslinked poly(vinyl alcohol) (cr-PVA) as gate insulator to study the variation of the mobility in CuPc with the distance from the gate insulator interface. By measuring the mobility of the charge carriers flowing along the channel as a function of the minimum thickness of the effective channel near to the transistor source, we demonstrate that the mobility is low near to the interface and shows a maximum at approximately 5nm from the interface. The mobility dependence on distance from interface can be modified through the inclusion of a poorly conducting thin PEDOT:PSS layer between gate insulator and channel semiconductor, which effectively acts as a gate insulator extension. This procedure is a simple but efficient strategy to improve organic field-effect transistor performance, positively affecting the transconductance and the mobility, which in the studied devices is increased by a factor 20. The improvement is attributed to the suppression of the deleterious consequences of interface charge traps on transport along the channel and is, in principle, a general approach applicable to other organic field-effect transistor materials combinations.
机译:电荷载流子迁移率是直接影响有机场效应晶体管性能的重要参数。我们使用具有交联聚乙烯醇(cr-PVA)的铜酞菁(CuPc)基晶体管作为栅极绝缘体,来研究CuPc中迁移率随距栅极绝缘体界面距离的变化。通过测量沿着沟道流动的电荷载流子的迁移率,该迁移率是靠近晶体管源极的有效沟道的最小厚度的函数,我们证明了迁移率在界面附近较低,并且在距界面约5nm处显示出最大值。可以通过在栅极绝缘体和沟道半导体之间包含导电不良的薄PEDOT:PSS层来修改迁移率对与界面距离的依赖性,这可以有效地充当栅极绝缘体的延伸。此过程是一种简单但有效的策略,可以提高有机场效应晶体管的性能,对跨导和迁移率产生积极影响,在研究的器件中,跨导和迁移率提高了20倍。这种改进归因于抑制了接口的有害后果电荷在沿着沟道的传输中捕获,并且原则上是适用于其他有机场效应晶体管材料组合的通用方法。

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