首页> 外国专利> Semiconductor component with field stop layer with p or n channel transistor has transistor gate arranged so potential exists between gate, bounding part of spatial charging zone area to cause a current to flow through field stop layer

Semiconductor component with field stop layer with p or n channel transistor has transistor gate arranged so potential exists between gate, bounding part of spatial charging zone area to cause a current to flow through field stop layer

机译:具有带有p或n沟道晶体管的场截止层的半导体组件的晶体管栅极布置为使栅极之间存在电势,空间电荷区区域的边界部分使电流流过场截止层

摘要

The device (1A) has a spatial charging zone area (5) and a field stop layer (4) with at least part of a p or n channel transistor for limiting a spatial charging zone that can be formed in the spatial charging zone area. The transistor's gate (14,19) is in direct contact with the spatial charging zone area. It is arranged so that a large enough potential exists between the gate and the bounding part of the spatial charging zone area to switch the p or n channel (15,16) of the transistor to cause a current to flow via the channel through the field stop layer.
机译:器件(1A)具有空间充电区区域(5)和具有p或n沟道晶体管的至少一部分的场截止层(4),用于限制可以在空间充电区区域中形成的空间充电区。晶体管的栅极(14,19)与空间充电区区域直接接触。布置成使得在栅极与空间电荷区区域的边界部分之间存在足够大的电势,以切换晶体管的p或n沟道(15,16),以使电流通过该沟道流过电场停止层。

著录项

  • 公开/公告号DE10334797B3

    专利类型

  • 公开/公告日2005-05-25

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2003134797

  • 发明设计人 PFIRSCH FRANK;

    申请日2003-07-30

  • 分类号H01L29/70;H01L29/06;

  • 国家 DE

  • 入库时间 2022-08-21 22:01:20

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