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High-mobility solution-processed copper phthalocyanine-based organic field-effect transistors

机译:高迁移率溶液处理的基于酞菁铜的有机场效应晶体管

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摘要

Solution-processed films of 1,4,8,11,15,18,22,25-octakis(hexyl) copper phthalocyanine (CuPc6) were utilized as an active semiconducting layer in the fabrication of organic field-effect transistors (OFETs) in the bottom-gate configurations using chemical vapour deposited silicon dioxide (SiO2) as gate dielectrics. The surface treatment of the gate dielectric with a self-assembled monolayer of octadecyltrichlorosilane (OTS) resulted in values of 4×10−2 cm2 V−1 s−1 and 106 for saturation mobility and on/off current ratio, respectively. This improvement was accompanied by a shift in the threshold voltage from 3 V for untreated devices to -2 V for OTS treated devices. The trap density at the interface between the gate dielectric and semiconductor decreased by about one order of magnitude after the surface treatment. The transistors with the OTS treated gate dielectrics were more stable over a 30-day period in air than untreated ones.
机译:1,4,8,11,15,18,22,25辛基(己基)酞菁铜(CuPc6)的固溶处理膜用作有源场效应晶体管,用于制造有机场效应晶体管(OFET)。使用化学气相沉积二氧化硅(SiO2)作为栅极电介质的底栅配置。用十八烷基三氯硅烷(OTS)自组装单层对栅极电介质进行表面处理,得到的值为4×10 -2 cm 2 V -1 < / sup> s -1 和10 6 分别用于饱和迁移率和开/关电流比。这种改进伴随着阈值电压从未处理设备的3 V变为OTS处理设备的-2V。在表面处理之后,栅极电介质和半导体之间的界面处的陷阱密度降低了大约一个数量级。经过OTS处理的栅极电介质的晶体管在30天的空气中比未处理的晶体管更稳定。

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