Electrochemically deposited ZnO nanostructured array films as antireflection coating on silicon heterojunction solar cells

摘要

In order to improve the short-circuit current and the efficiency of silicon heterojunction solar cells, Ag grid/ITO/(p)a-Si:H/(i) a-Si:H/(n)c-Si/(i)a-Si:H/(n+)a-Si:H/Al, ZnO nanostructured (NS) array films are deposited by electrochemical method on the front side of the solar cells. Aqueous solutions of ZnCl_2 and KCl at temperature of 80 ℃ were used as electrolyte, employing a three-electrode electro-chemical cell with saturat- ed calomel electrodes as reference electrode. The spectra of reflectance and diffused reflection of ZnO NS array films deposited on the front side of the solar cells structures are presented for samples before and after ZnO deposition. The solar cell parameters are compared, as well, and the results demonstrate increase in short-circuit current and efficiency.