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首页> 外文期刊>Physica status solidi >Optimization of the source field-plate design for low dynamic R_(DS-ON) dispersion of AIGaN/GaN MIS-HEMTs
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Optimization of the source field-plate design for low dynamic R_(DS-ON) dispersion of AIGaN/GaN MIS-HEMTs

机译:优化AIGaN / GaN MIS-HEMT的低动态R_(DS-ON)色散源场板设计

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摘要

AIGaN/GaN MIS-HEMTs with two levels of source field-plates were studied by means of pulsed I-V measurements. These measurements showed that the presence of a source field-plate itself is not enough to guarantee a low dynamic R_(DS-ON) at high OFF-state drain-bias. Simulations of the electric field were carried out to explain the experimental results. It was found that not only does the intensity of the electric field affects the dynamic R_(DS-ON), but also that the position of the electric field peaks plays a role in the trapping phenomenon, responsible for the dynamic R_(DS-ON) increase at high OFF-state drain-bias. These results show that the source field-plate must be carefully designed in order to obtain a low dynamic R_(DS-ON) at high bias.
机译:通过脉冲I-V测量研究了具有两层源极场板的AIGaN / GaN MIS-HEMT。这些测量表明,源极场板本身的存在不足以保证在高截止状态漏极偏置下的低动态R_(DS-ON)。进行了电场模拟以解释实验结果。发现不仅电场强度会影响动态R_(DS-ON),而且电场峰值的位置也会在捕获现象中起作用,从而引起动态R_(DS-ON)。 )在高截止状态漏极偏置时增加。这些结果表明,必须认真设计源极场板,以便在高偏置下获得低动态R_(DS-ON)。

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