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Studies on structural, optical, and photoelectric properties of CdS_(1-x)Se_x films fabricated by selenization of chemical bath deposited CdS films

机译:化学镀硒化CdS薄膜硒化制备CdS_(1-x)Se_x薄膜的结构,光学和光电性能研究

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摘要

In this paper, high-pholoxensitive CdS_(1-x)Se_x films arc synthesized by a two-step technique, which includes the chemical bath deposition of CdS films and a following selenization process. The structural, optical, and photoelectric properties of the CdS_(1-x)Se_x films were investigated. With the substitution of selenium for sulfur atoms, grain sizes of the as-prepared CdS_(1-x)Se_x films arc effectively enlarged and reach the scales of the films thickness when the sclenization temperature exceeds 450 ℃. With increasing the selenization temperature from 350 to 550 ℃, the band gaps of CdS_(1-x)Se_x films gradually decrease from 2.37 to 1.82eV. Under the co-action of the grain-size enlargement and band-gap decrease, the CdS_(1-x)Se_x films fabricated at 450 ℃ show very pronounced photosensitivity. Noteworthy, the ratio of photo to dark conductivity of the CdS_(1-x)Se_x film selenized at 450 ℃ reaches 1.1 × 10~5, suggesting a promising application potential in the photoelectric devices.
机译:本文采用两步法合成了高光吸收性的CdS_(1-x)Se_x薄膜,该步骤包括化学浴沉积CdS薄膜和随后的硒化工艺。研究了CdS_(1-x)Se_x薄膜的结构,光学和光电性能。用硒代替硫原子,制备的CdS_(1-x)Se_x薄膜的晶粒尺寸有效地增大,并在硒化温度超过450℃时达到薄膜厚度的尺度。随着硒化温度从350升高到550℃,CdS_(1-x)Se_x薄膜的带隙从2.37eV逐渐减小到1.82eV。在晶粒尺寸增大和带隙减小的共同作用下,以450℃制备的CdS_(1-x)Se_x薄膜表现出非常显着的光敏性。值得注意的是,在450℃硒化的CdS_(1-x)Se_x薄膜的光导与暗电导率之比达到1.1×10〜5,表明在光电器件中具有广阔的应用前景。

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  • 来源
    《Physica status solidi》 |2017年第2期|1600664.1-1600664.5|共5页
  • 作者单位

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    School of Mechanical Engineering, Changzhou University, Changzhou 213164, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

    Department of Physics, Changshu Institute of Technology, Changshu 215500, P.R. China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    band gap; CdS_(1-x)Se_x films; chemical bath deposition; photosensitivity; selenization; thin films;

    机译:带隙CdS_(1-x)Se_x膜;化学浴沉积;光敏性硒化薄膜;

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