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机译:缓冲多孔层和掺杂在GalnP-porGaAs-GaAs异质结构中的作用
Department, Voronezh State University, Universiteskaya pl. 1, 394006 Voronezh, Russia;
Department, Voronezh State University, Universiteskaya pl. 1, 394006 Voronezh, Russia;
Department, Voronezh State University, Universiteskaya pl. 1, 394006 Voronezh, Russia;
Department, Voronezh State University, Universiteskaya pl. 1, 394006 Voronezh, Russia;
Ioffe Physical and Technical Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia;
Ioffe Physical and Technical Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia;
mechanical properties; surface strains; scanning electron microscopy (SEM) (including EBIC); defects and impurities: doping, implantation, distribution, concentration, etc.; other semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions; disordered solids; porous materials; granular materials;
机译:多孔缓冲层和掺do对GaInP:Dy / por-GaAs / GaAs(100)异质结构内应力的影响
机译:关于异质结构外延层之间的缓冲多孔层对异质双极晶体管中掺杂剂浓度分布的影响
机译:掺杂铍的GaN缓冲层对外延AlGaN / GaN异质结构的电子性能的影响
机译:映射寿命和掺杂密度的新型扫描光致发光技术:应用于碳掺杂的InGaAs / InP层和异质结构
机译:使用各种缓冲层在硅(111)晶圆上生长和表征氮化铝镓/氮化镓异质结构。
机译:石墨烯 - 碳2D异质结构具有分层多孔PN掺杂层状架构用于电容去离子
机译:关于异质结外延层之间的缓冲多孔层对异质双极晶体管中掺杂剂浓度分布的影响
机译:铍掺杂GaN缓冲层对外延alGaN / GaN异质结构电子性质的邻近效应