Thin-film thickness profile measurement using wavelet transform in wavelength-scanning interferometry

摘要

We proposed a new method for retrieving the phase from wavelength-scanning interferogram by wavelet transform. We demonstrate, with both theoretical and experimental data, that this method provides a reliable technique for retrieving phase in the wavelength-scanning interferometry. We show that the proposed method by wavelet transform can reconstruct the nonlinear phase better than the conventional Fourier transform and direct spectral phase calculation method by simulation. The patterned thin film is measured to get the thickness and surface profile simultaneously with the developed wavelength-scanning interferometry.