机译:相移掩膜设计用于chi闪耀光栅的干扰曝光
Department of Electronics, Kyoto Institute of Technology, Kyoto, 606-8585, Japan;
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki, 305-8568, Japan;
Department of Electronics, Kyoto Institute of Technology, Kyoto, 606-8585, Japan;
Department of Electronics, Kyoto Institute of Technology, Kyoto, 606-8585, Japan;
Research Institute for Electronic Science, Hokkaido University, Sapporo, 001-0020, Japan;
diffractive optics; blazed gratings; chirp gratings; optical interference; interference exposure; Fourier synthesis;
机译:相移掩膜设计用于interference闪耀光栅的干扰暴露
机译:使用深紫外光栅掩模通过干涉曝光进行亚波长抗蚀剂图案化:布拉格角入射与法向入射
机译:使用深紫外光栅掩模通过干涉曝光进行亚波长抗蚀剂图案化:布拉格角入射与法向入射
机译:半色调双曝光相移掩模的自动化设计
机译:用于相移掩模设计的广义逆光刻方法。
机译:基于子线性调频带宽重叠和分段发送的低相关干扰的OFDM线性调频线性调频脉冲波形设计
机译:偏振干扰和光栅梁分裂的空间相位转移干预系统:相移误差测试