首页> 外文期刊>Optical review >Phase-shifting mask design for interference exposure of chirp blazed grating
【24h】

Phase-shifting mask design for interference exposure of chirp blazed grating

机译:相移掩膜设计用于interference闪耀光栅的干扰暴露

获取原文
获取原文并翻译 | 示例
       

摘要

An interference exposure system using a phase-shifting mask was proposed for generating periodic sawtooth optical intensity profile with chirp in period. Multiple space-harmonic waves are launched from the mask by diffraction, and the sawtooth optical intensity is formed by interference based on Fourier synthesis after propagation through an air gap. The design concept merely utilizing positive diffraction-order harmonics with tilt illumination of an exposure light and a design algorithm based on time-reversed configuration for calculating required phase shift amount were proposed and discussed. A phase-shifting mask for a blazed grating of very high chirp rate was designed to demonstrate its potential and feasibility. The grating period changes from 2.2 to 3.1 μm gradually within 0.3 mm length. Sawtooth-like optical intensity profile was confirmed by theoretical simulation as well as preliminary experimental results.
机译:提出了一种使用相移掩模的干涉曝光系统,用于产生周期线性chi声的周期性锯齿光强度分布。通过衍射从掩模发射出多个空间谐波波,并且在通过气隙传播之后,基于傅立叶合成的干涉形成了锯齿状的光强度。提出并讨论了仅利用曝光光的倾斜照明的正衍射级次谐波的设计思想以及基于时间倒置构造的计算所需相移量的设计算法。设计了用于非常高chi率的闪耀光栅的相移掩模,以证明其潜力和可行性。光栅周期在0.3 mm的范围内从2.2μm逐渐变为3.1μm。通过理论模拟和初步的实验结果证实了锯齿状的光强度分布。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号