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The Most Reliable and Precise Model to Determine Schottky Barrier Height and Photoelectron Yield Spectroscopy

机译:确定肖特基势垒高度和光电子产率谱的最可靠,最精确的模型

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摘要

Schottky barrier height (SBH), plays a crucial role in the design of electronic and photo-electronic devices. In order to reckon SBH via internal photoemission (IPE), the technique is through extrapolating square root of IPE yield-and cube root of IPE yield-photon energy plots to zero before this work, this work was motivated by the most reliable and precise model to determine the SBH via IPE. A phenomenological model for connection IPE quantum yield and photon energy has been successfully established based on Fermi-Dirac distribution. The results of experimental observations fitted via the model indicate that the modeled quantum yield agrees well with experimental data. This model emphasizes the threshold of photon energy for calculating SBH, and the SBH of InN/GaN, p-type GaP/p-type Si, Pt/GaP, Au/GaAs, Si/SiO2 and Cu/SiO2 were obtained with high reliability after the method had been applied.
机译:肖特基势垒高度(SBH)在电子和光电设备的设计中起着至关重要的作用。为了通过内部光发射(IPE)估算SBH,该技术是在此工作之前通过将IPE产量的平方根和IPE产量-光子能量图的立方根外推到零来完成这项工作的,通过IPE确定SBH。基于费米-狄拉克分布成功建立了连接IPE量子产率和光子能量的现象学模型。通过模型拟合的实验观察结果表明,模拟的量子产率与实验数据吻合良好。该模型强调了计算SBH的光子能量阈值,并以高可靠性获得了InN / GaN,p型GaP / p型Si,Pt / GaP,Au / GaAs,Si / SiO2和Cu / SiO2的SBH。应用该方法后。

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