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首页> 外文期刊>Optical and quantum electronics >Analysis of dark current and spectral response mechanisms for Si-based block-impurity-band detectors operating at terahertz regime
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Analysis of dark current and spectral response mechanisms for Si-based block-impurity-band detectors operating at terahertz regime

机译:对以太赫兹频率工作的硅基块杂质带探测器的暗电流和光谱响应机制的分析

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摘要

Si-based blocked-impurity-band (BIB) detector with enhanced terahertz-photo-detection capability has been realized, and an accurate physics-based numerical model has been constructed. The simulation is in good agreement with the experiment. Based on experimental measurements and numerical simulations, dark current and spectral response mechanisms in Si-based BIB detectors are investigated. Our results reveal that the dark current is dominated by the impurity-band conductance when the temperature is below a critical value, while above this critical value, the dark current will be dominated by the conduction-band conductance instead. The dependences of dark current and peak responsivity on the thickness of the blocking layer are quantitatively studied. It is demonstrated that a trade-off between dark current and peak responsivity has to be made for the optimal thickness of the blocking layer.
机译:实现了具有增强的太赫兹光检测能力的基于Si的阻塞杂质带(BIB)检测器,并构建了基于物理的精确数值模型。仿真与实验吻合良好。基于实验测量和数值模拟,研究了基于Si的BIB检测器中的暗电流和光谱响应机制。我们的结果表明,当温度低于临界值时,暗电流由杂质带电导决定,而高于该临界值时,暗电流将由导带电导控制。定量研究了暗电流和峰值响应度对阻挡层厚度的依赖性。已经证明,必须在暗电流和峰值响应度之间进行权衡,才能获得最佳的阻挡层厚度。

著录项

  • 来源
    《Optical and quantum electronics》 |2016年第2期|100.1-100.10|共10页
  • 作者单位

    No. 50 Research Institute of China Electronics Technology Group Corporation, 318 Chang He Road, Shanghai 200331, China;

    No. 50 Research Institute of China Electronics Technology Group Corporation, 318 Chang He Road, Shanghai 200331, China;

    No. 50 Research Institute of China Electronics Technology Group Corporation, 318 Chang He Road, Shanghai 200331, China;

    No. 50 Research Institute of China Electronics Technology Group Corporation, 318 Chang He Road, Shanghai 200331, China;

    Laboratory of Advanced Material, Fudan University, Shanghai 200438, China;

    No. 50 Research Institute of China Electronics Technology Group Corporation, 318 Chang He Road, Shanghai 200331, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Silicon; Blocked-impurity-band (BIB); Blocking layer; Absorbing layer; Dark current; Spectral response;

    机译:硅;阻塞杂质带(BIB);阻挡层;吸收层;暗电流光谱响应;

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