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The fabrication and lasing characteristics of oxide-confined 795 nm VCSELs with close and open isolation trenches

机译:具有封闭和开放隔离沟槽的氧化物限制的795 nm VCSEL的制造和激光特性

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摘要

In this paper, 795 nm vertical cavity surface emitting lasers (VCSELs) with close and open isolation trench structures have been designed and produced. An Al_2O_3 aperture with a diameter of 4 μm was formed by oxidizing the AlAs layer to confine the current and lateral optical mode. The characteristics of the VCSEL based on Al_(0.07) Ga_(0.93)As/Al_(0.35)Ga_(0.65)As multiple quantum wells (MQWs) under continuous wave operation show that the VCSEL with close isolation trench structure has a threshold current of about 1.5 mA and a maximum optical output power of 0.35 mW, and it exhibits a single mode operation below 3.5 mA. However, the VCSEL with an open isolation trench structure shows a much larger threshold current of 6 mA due to a current leakage through the connecting and surrounding area and more high order modes will be incurred by increasing the driving current. The simplification of the fabrication process of the VCSELs with open isolation trenches is obtained at the cost of poor performance. By introducing strain in the MQWs, the Al_(0.15)Ga_(0.75)In_(0.1)As/Al_(0.4)Ga_(0.6)As MQWs based VCSEL with close isolation trench structure exhibits a threshold current as low as 0.42 mA.
机译:本文设计并生产了具有封闭和开放隔离沟槽结构的795 nm垂直腔表面发射激光器(VCSEL)。通过氧化AlAs层以限制电流和横向光学模式,形成了直径为4μm的Al_2O_3孔径。基于Al_(0.07)Ga_(0.93)As / Al_(0.35)Ga_(0.65)As多量子阱(MQW)的VCSEL在连续波操作下的特性表明,具有紧密隔离沟槽结构的VCSEL的阈值电流为它具有约1.5 mA的最大输出功率和0.35 mW的光输出功率,并且在3.5 mA以下具有单模工作模式。但是,由于通过连接和周围区域的电流泄漏,具有开放式隔离沟槽结构的VCSEL的阈值电流要大得多,为6 mA,并且通过增加驱动电流会导致出现更高阶的模式。带有开口隔离沟槽的VCSEL的制造工艺得以简化,但代价是性能较差。通过在MQWs中引入应变,具有紧密隔离沟槽结构的基于MQWs的Al_(0.15)Ga_(0.75)In_(0.1)As / Al_(0.4)Ga_(0.6)As VCSEL表现出低至0.42 mA的阈值电流。

著录项

  • 来源
    《Optical and quantum electronics》 |2017年第11期|361.1-361.11|共11页
  • 作者单位

    Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123, People's Republic of China;

    Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123, People's Republic of China;

    Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123, People's Republic of China,University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China;

    Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123, People's Republic of China;

    Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123, People's Republic of China,University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China;

    Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123, People's Republic of China,University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Vertical cavity surface emitting lasers; Multiple quantum wells; Semiconductor Ⅲ-V materials; Photoelectronic device;

    机译:垂直腔表面发射激光器;多量子阱;半导体Ⅲ-Ⅴ材料;光电装置;

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