首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Effect of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering
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Effect of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering

机译:氢化对射频磁控溅射制备的GaAs薄膜的光学和结构性能的影响

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We have utilized infra-red and optical absorption measurements, grazing incidence X-ray diffraction (GIXRD) and extended X-ray absorption fine structure (EXAFS) measurements to investigate the influence of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering. Hydrogenation induces distinct changes in the optical properties, namely shifts in the absorption edges and reduction of the Urbach energy. Such modifications are correlated to a reduction in structural disorder as determined by EXAFS and the increase of crystallinity determined by GIXRD. (c) 2005 Elsevier B.V. All rights reserved.
机译:我们已经利用红外和光学吸收测量,掠入射X射线衍射(GIXRD)和扩展X射线吸收精细结构(EXAFS)测量来研究氢化对由NaCl制备的GaAs薄膜的光学和结构性质的影响。射频磁控溅射。氢化引起光学性质的明显变化,即吸收边缘的偏移和Urbach能量的减少。此类修饰与通过EXAFS确定的结构紊乱的减少和通过GIXRD确定的结晶度的增加相关。 (c)2005 Elsevier B.V.保留所有权利。

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