Proton beam micromachined buried microchannels in negative tone resist materials

摘要

In the present work the Atomki, Debrecen microprobe facility has been used to write long tilted structures by 2 MeV protons. For the formation of the structures, two exposures have been carried out at +20° and -20° using a goniometer stage sample holder. The tilted structures were resolved in the negative tone resist materials SU-8 and ADEPR (an aqueous base developable chemically amplified resist). The length of the microchannels was varied between 100 μm and 1000 μm, the wall thickness was less than 10 μm. By applying the developed methodology it was possible to resolve the desired layout through the whole length of the channel.