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机译:磁控溅射沉积导电透明ITO / Ni / ITO多层膜的研究
School of Materials Science and Engineering, University of Ulsan, San 29, Mugeo-dong, Nam-gu, Ulsan 680-749, Republic of Korea;
School of Materials Science and Engineering, University of Ulsan, San 29, Mugeo-dong, Nam-gu, Ulsan 680-749, Republic of Korea;
School of Materials Science and Engineering, University of Ulsan, San 29, Mugeo-dong, Nam-gu, Ulsan 680-749, Republic of Korea;
School of Materials Science and Engineering, University of Ulsan, San 29, Mugeo-dong, Nam-gu, Ulsan 680-749, Republic of Korea;
Analysis Support Team, Ulsan Fine Chemical Industry Center, 411 Daun-dong, Jung-gu, Ulsan, Republic of Korea;
School of Materials Science and Engineering, University of Ulsan, San 29, Mugeo-dong, Nam-gu, Ulsan 680-749, Republic of Korea;
ITO; Ni; XRD; sheet resistance; optical transmittance;
机译:射频磁控溅射沉积近紫外透明导电ITO / Ga_2O_3多层膜的电学和光学性质
机译:在低衬底温度下通过射频磁控溅射沉积的Ti:ITO薄膜的透明导电特性
机译:通过磁控溅射沉积的透明导电NTTO / Cu / NTTO多层膜的光学和电性能
机译:陶瓷和金属旋转靶材通过脉冲直流磁控溅射在低温下沉积的高导电性和透明ITO膜
机译:溅射参数对RF磁控溅射沉积ITO膜的影响
机译:射频直流和射频叠加直流磁控溅射沉积的透明导电掺铝ZnO多晶薄膜的载流子输运和晶体学取向特征
机译:ITO和AZO共溅射沉积的透明导电氧化物膜的研究
机译:真空沉积多层薄膜电容器的研究