机译:碳化硅纳米晶体对低能质子和氦离子的电子截止能力中的沟道效应的理论研究
The Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China,School of Nuclear Science and Technology, University of South China, Hengyang 421001, China;
School of Materials Science and Engineering, Anhui University of Science & Technology, Huainan 232001, China;
The Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China,Beijing Radiation Center, Beijing 100875, China,Center of Theoretical Nuclear Physics, National Laboratory of Heavy Ion Accelerator of Lanzhou, Lanzhou 730000, China;
Stopping power; Channeling effect; Electron transfer; Molecular dynamics;
机译:硅晶体中氦气和锂离子的电子截止功率和角能损耗依赖性
机译:碳化硅中金离子的离子分布和电子停止能力
机译:Al _2O _3中质子的电子停止截面:实验和理论研究
机译:嵌入SiO_2中的硅纳米晶体的电子和结构性质的实验和理论联合研究:界面区域的积极作用
机译:二氧化硅/碳化硅界面的微结构和化学研究及其与碳化硅MOS二极管和碳化硅MOSFET的电学性质的关系。
机译:碳化硅基体中硅纳米晶的快速热退火和结晶机理研究
机译:电子停止用于质子和第一原理电子动力学的质子和α分子:碳化硅的情况
机译:阻止低能质子的固体能力