机译:3-5 MeV / u硅离子在高Z原子中产生的L X射线截面
Department of Physics, Dev Samaj College, Sec 45-B, Chandigarh 160047, India,Department of Physics, Punjab University, Chandigarh 160014, India;
Department of Applied Sciences, Chitkara University, Himachal Pradesh 174103, India;
Department of Applied Sciences, Chitkara University, Himachal Pradesh 174103, India,The Marian Smoluchowsti Institute of Physics, Jagiellonian University, Lojasiewicza 11, 30-348 Krakow, Poland;
Department of Physics, Punjabi University, Patiala, Punjab 147002, India;
Department of Physics, Punjab University, Chandigarh 160014, India;
Department of Physics, Punjab University, Chandigarh 160014, India;
Institute de Astronomia y Fisica del Espacio, CONICET and Universidad de Buenos Aires, Buenos Aires, Argentina;
Institute de Astronomia y Fisica del Espacio, CONICET and Universidad de Buenos Aires, Buenos Aires, Argentina;
Inter-University Accelerator Centre, JNU New Campus, NewDelhi 110067, India;
L-shell x-rays; Heavy ions; Ionization; Multiple-ionization;
机译:W和TL M-Shell X射线产生横截面,由碳离子的能量介于1.56meV和5 MeV之间
机译:由2 MeV和5 MeV之间的碳离子诱导的Ag和All的L壳X射线产生截面
机译:通过〜9Be〜(2+)离子在5.25 MeV至6.75 MeV范围内的能量撞击,测量Ce,Nd,Sm,Eu,Gd和Dy的L X射线产生截面
机译:能量低于1 MeV的质子对L壳X射线产生的横截面的现状
机译:0.4和铀M壳X射线产生的横截面,用于0.4–4.0 MeV质子,0.4–6.0 MeV氦离子,4.5–11.3 mev碳离子和4.5–13.5 MeV氧离子
机译:36AR(dα)34mcl40ar(dα)38cl和40ar(dp)低于8.4 mev的41ar核反应的横截面
机译:Ti,Fe,Zn,Nb和Ta诱导X射线产生的截面 O,Cl,Cu和Br离子的能量在4 meV和40 meV之间