首页> 外文期刊>Nuclear Instruments & Methods in Physics Research >Comparison of charged particle identification using pulse shape discrimination and △E-E methods between front and rear side injection in silicon detectors
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Comparison of charged particle identification using pulse shape discrimination and △E-E methods between front and rear side injection in silicon detectors

机译:硅探测器正面和背面注入之间使用脉冲形状判别和△E-E方法识别带电粒子的比较

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摘要

The response of silicon-silicon-CsI(Tl) telescopes, developed within the FAZIA collaboration, to fragments produced in nuclear reactions ~(84)Kr+ ~(120-124)Sn at 35AMeV, has been used to study ion identification methods. Two techniques are considered for the identification of the nuclear products in the silicon stages. The standard △E-E one requires signals induced in two detection layers by ions punching through the first one. Conversely, the digital Pulse Shape Analysis (PSA) allows the identification of ions stopped in the first silicon layer. The capabilities of these two identification methods have been compared for different mountings of the silicons, i.e. rear (particles entering through the low electric field side) or front (particles entering through the high electric field side) side injection. The △E-E identification method gives exactly the same results in both configurations. At variance, the pulse shape discrimination is very sensitive to the detector mounting. In case of rear side injection, the identification with the "energy vs. charge rise time" PSA method presents energy thresholds which are significantly lower than in the case of front side injection.
机译:FAZIA合作开发的硅-硅-CsI(Tl)望远镜对在35AMeV的核反应〜(84)Kr +〜(120-124)Sn中产生的碎片的反应已用于研究离子识别方法。考虑了两种技术来鉴定硅阶段中的核产物。标准的△E-E信号要求通过离子穿透第一层在两个检测层中感应出的信号。相反,数字脉冲形状分析(PSA)可以识别在第一硅层中停止的离子。对于硅的不同安装,即后侧(通过低电场侧进入的粒子)或前侧(通过高电场侧进入的粒子)注入,已经比较了这两种识别方法的能力。两种配置中的△E-E识别方法给出的结果完全相同。变化时,脉冲形状的区分对检测器的安装非常敏感。在背面喷射的情况下,通过“能量与电荷上升时间” PSA方法进行的识别显示的能量阈值显着低于正面喷射的情况。

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