Radiation tolerance study of a commercial 65 nm CMOS technology for high energy physics applications

摘要

This paper reports the radiation tolerance study of a commercial 65 nm technology, which is a strong candidate for the Large Hadron Collider applications. After exposure to 3 MeV protons till 1 Grad dose, the 65 nm CMOS transistors, especially the pMOSFETs, showed severe long-term degradation mainly in the saturation drain currents. There were some differences between the degradation levels in the nMOSFETs and the pMOSFETs, which were likely attributed to the positive charges trapped in the gate spacers. After exposure to heavy ions till multiple strikes, the pMOSFETs did not show any sudden loss of drain currents, the degradations in the characteristics were negligible.