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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Radiation damage effects on double-SOI pixel sensors for X-ray astronomy
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Radiation damage effects on double-SOI pixel sensors for X-ray astronomy

机译:X射线天文学双SOI像素传感器对辐射损伤效应

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摘要

The X-ray SOI pixel sensor onboard the FORCE satellite will be placed in the low earth orbit and will consequently suffer from the radiation effects mainly caused by geomagnetically trapped cosmic-ray protons. Based on previous studies on the effects of radiation on SOI pixel sensors, the positive charges trapped in the oxide layer significantly affect the performance of the sensor. To improve the radiation hardness of the SOI pixel sensors, we introduced a double-SOI (D-SOI) structure containing an additional middle Si layer in the oxide layer. The negative potential applied on the middle Si layer compensates for the radiation effects, due to the trapped positive charges. Although the radiation hardness of the D-SOI pixel sensors for applications in high-energy accelerators has been evaluated, radiation effects for astronomical application in the D-SOI sensors has not been evaluated thus far. To evaluate the radiation effects of the D-SOI sensor, we perform an irradiation experiment using a 6-MeV proton beam with a total dose of ~ 5 krad, corresponding to a few tens of years of in-orbit operation. This experiment indicates an improvement in the radiation hardness of the X-ray D-SOI devices. On using an irradiation of 5 krad on the D-SOI device, the energy resolution in the full-width half maximum for the 5.9-keV X-ray increases by 7 ± 2%, and the chip output gain decreases by 0.35 ± 0.09%. The physical mechanism of the gain degradation is also investigated; it is found that the gain degradation is caused by an increase in the parasitic capacitance due to the enlarged buried n-well.
机译:X射线SOI像素传感器在牙架上将力卫星置于低地球轨道中,因此将受到主要由地磁捕获的宇宙射线质子引起的辐射效应。基于先前研究辐射对SOI像素传感器的影响,捕获在氧化物层中的正电荷显着影响传感器的性能。为了提高SOI像素传感器的辐射硬度,我们引入了在氧化物层中包含另外的中间Si层的双SOI(D-SOI)结构。由于捕获的正电荷,施加在中间Si层上的负电位补偿了辐射效应。尽管已经评估了用于高能量加速器中的应用的D-SOI像素传感器的辐射硬度,但到目前为止还没有评估D-SOI传感器中的天文应用的辐射效应。为了评估D-SOI传感器的辐射效应,我们使用具有〜5 krad的总剂量的6 mev质子梁进行辐射实验,对应于几年的轨道操作。该实验表明X射线D-SOI器件的辐射硬度改善。在D-SOI器件上使用5 krad的照射,5.9-keV X射线的全宽半最大的能量分辨率为7±2%,芯片输出增益减少0.35±0.09% 。还研究了增益降解的物理机制;结果发现,由于扩大的掩埋N阱导致的寄生电容增加是由于寄生电容的增加引起的。

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    Department of Physics School of Science and Technology Tokyo University of Science 2641 Yamazaki Noda Chiba 278-8510 Japan;

    Department of Physics School of Science and Technology Tokyo University of Science 2641 Yamazaki Noda Chiba 278-8510 Japan;

    Department of Physics School of Science and Technology Tokyo University of Science 2641 Yamazaki Noda Chiba 278-8510 Japan;

    Department of Physics School of Science and Technology Tokyo University of Science 2641 Yamazaki Noda Chiba 278-8510 Japan;

    Department of Physics School of Science and Technology Tokyo University of Science 2641 Yamazaki Noda Chiba 278-8510 Japan;

    Department of Physics School of Science and Technology Tokyo University of Science 2641 Yamazaki Noda Chiba 278-8510 Japan;

    Department of Physics School of Science and Technology Tokyo University of Science 2641 Yamazaki Noda Chiba 278-8510 Japan;

    Department of Physics Faculty of Science Kyoto University Kitashirakawa-Oiwakecho Sakyo-ku Kyoto 606-8502 Japan;

    Department of Physics Faculty of Science Kyoto University Kitashirakawa-Oiwakecho Sakyo-ku Kyoto 606-8502 Japan;

    Department of Physics Faculty of Science Kyoto University Kitashirakawa-Oiwakecho Sakyo-ku Kyoto 606-8502 Japan;

    Department of Physics Faculty of Science Kyoto University Kitashirakawa-Oiwakecho Sakyo-ku Kyoto 606-8502 Japan;

    Department of Physics Faculty of Science Kyoto University Kitashirakawa-Oiwakecho Sakyo-ku Kyoto 606-8502 Japan;

    Department of Physics Faculty of Science Kyoto University Kitashirakawa-Oiwakecho Sakyo-ku Kyoto 606-8502 Japan;

    Department of Applied Physics Faculty of Engineering University of Miyazaki 1-1 Gakuen-Kibanodai-Nishi Miyazaki Miyazaki 889-2192 Japan;

    Department of Applied Physics Faculty of Engineering University of Miyazaki 1-1 Gakuen-Kibanodai-Nishi Miyazaki Miyazaki 889-2192 Japan;

    Department of Applied Physics Faculty of Engineering University of Miyazaki 1-1 Gakuen-Kibanodai-Nishi Miyazaki Miyazaki 889-2192 Japan;

    Department of Applied Physics Faculty of Engineering University of Miyazaki 1-1 Gakuen-Kibanodai-Nishi Miyazaki Miyazaki 889-2192 Japan;

    Department of Applied Physics Faculty of Engineering University of Miyazaki 1-1 Gakuen-Kibanodai-Nishi Miyazaki Miyazaki 889-2192 Japan;

    Institute of Particle and Nuclear Studies High Energy Accelerator Research Organization (KEK) 1-1 Oho Tskuba Ibaraki 305-0801 Japan;

    Department of Advanced Accelerator Technologies High Energy Accelerator Research Organization (KEK) 1-1 Oho Tskuba Ibaraki 305-0801 Japan;

    National Institute of Radiological Sciences National Institutes for Quantum and Radiological Science and Technology 4-9-1 Anagawa Inage-ku Chiba-City Chiba 263-8555 Japan;

    National Institute of Radiological Sciences National Institutes for Quantum and Radiological Science and Technology 4-9-1 Anagawa Inage-ku Chiba-City Chiba 263-8555 Japan;

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  • 正文语种 eng
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  • 关键词

    Radiation damage; SOI pixel; X-ray; Imaging spectroscopy; Astronomy; TID;

    机译:辐射损坏;SOI像素;X射线;成像光谱;天文学;t;

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