首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Characterization of small-pixel passive CMOS sensors in 150 nm LFoundry technology using the RD53A readout chip
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Characterization of small-pixel passive CMOS sensors in 150 nm LFoundry technology using the RD53A readout chip

机译:使用RD53A读数芯片在150nm LFoundry技术中表征小像素无源CMOS传感器

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Passive CMOS pixel sensors in 150 nm CMOS technology offered by LFoundry were designed and assembled into hybrid pixel modules. Advantages of commercial CMOS processes are high throughput at comparatively low costs which makes them attractive for the usage of large-area detectors. Further benefits originate from multiple metal layers, metal-insulator-metal capacitors, and polysilicon layers which can be used to enhance the sensor design. Thinned sensors were bump-bonded to the RD53A readout chip and characterized in laboratory environment and with a minimum ionizing 2.5 GeV electron beam. Their performance in terms of noise and hit-detection efficiency equals that of conventional planar pixel sensors.
机译:由LFoundry提供的150nm CMOS技术中的被动CMOS像素传感器被设计并组装成混合像素模块。商业CMOS工艺的优点是在相对低的成本下的吞吐量高,这使得它们对于使用大面积探测器的使用具有吸引力。进一步的益处源自多种金属层,金属绝缘体 - 金属电容器和多晶硅层,可用于增强传感器设计。稀释的传感器被撞击到RD53A读数芯片,并在实验室环境中表征,并具有最小电离2.5 GEV电子束。它们在噪声和击中检测效率方面的性能等于传统平面像素传感器的性能。

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