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Radiation tolerant, thin, passive CMOS sensors read out with the RD53A chip

机译:辐射耐受,薄,无源CMOS传感器用RD53A芯片读出

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The radiation hardness of passive CMOS pixel sensors fabricated in 150 nm LFoundry technology is investigated. CMOS process lines are especially of interest for large-scale silicon detectors as they offer high production throughput at comparatively low cost. Moreover, several features like poly-silicon resistors, MIM-capacitors and several metal layers are available which can help enhance the sensor design. The performance of a 100 μm thin passive CMOS sensor with a pixel pitch of 50 μm at different irradiation levels, 5 × 10~(15) n_(eq) cm~(-2) and 1 × 10~(16) n_(eq) cm~(-2), is presented. The sensor was bump-bonded and read out using the RD53A readout chip. After the highest fluence a hit-detection efficiency larger than 99 % is measured for minimum ionising particles. The measured equivalent noise charge is comparable to conventional planar pixel sensors. Passive CMOS sensors are thus an attractive option for silicon detectors operating in radiation harsh environments like the upgrades for the LHC experiments.
机译:研究了在150nm LFoundry技术中制造的无源CMOS像素传感器的辐射硬度。 CMOS工艺线对大型硅探测器特别感兴趣,因为它们以相对低的成本提供高生产产量。此外,有几个特征,如多晶硅电阻器,MIM电容器和多个金属层,可帮助增强传感器设计。 100μm薄无源CMOS传感器的性能,在不同的照射水平下具有50μm的像素间距,5×10〜(15)n_(eq)cm〜(-2)和1×10〜(16)n_(eq )CM〜(-2)。传感器撞击并使用RD53A读数芯片读出。在最高流速后,测量大于99%的击中检测效率,用于最小电离颗粒。测量的等效噪声电荷与传统的平面像素传感器相当。因此,被动CMOS传感器是一种有吸引力的硅探测器,其在辐射恶劣环境中操作,如LHC实验的升级。

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