机译:材料与设计对2.5 D集成电路的通玻璃通孔可靠性的影响:数值研究
Materials Science and Engineering University of Central Florida Orlando Florida USA;
Department of Mechanics and Reliability Sciences Corning Inc Corning New York USA;
Department of Integration Technologies Corning Inc Corning New York USA;
Materials Science and Engineering University of Central Florida Orlando Florida USA;
Through-glass vias; 2.5 D interposers; Finite element analysis; Substrate cracking; Thermo-mechanical stresses; CTE mismatch; Energy release rate;
机译:通过玻璃通孔的互补可靠性2.5D集成电路
机译:三维集成电路中硅穿孔(TSV)和焊料互连的热机械可靠性的数值分析
机译:关于局部材料化学对封装集成电路的机械可靠性的影响的案例研究:封装辐射与钝化电介质化学的相关性
机译:3维集成电路中的硅通孔(TSVS)和焊点互连的热机械可靠性
机译:对3D集成电路中通过硅通孔的热应力和可靠性的缩放和微观结构效应
机译:从封面开始:用于集成电路的材料和非共面网格设计具有对极端机械变形的线性弹性响应
机译:新型二维材料设计与实现三元逻辑集成电路