Soft X-ray lithography of high aspect ratio SU8 submicron structures

摘要

SU8 submicron structures with an aspect ratio of more than 50 are made by soft X-ray lithography using modified spectra of the synchrotron radiation at the ANKA LITHO-1 beamline, which includes a chromium mirror. The X-ray spectrum is additional shaped by a beam stop and a filter to a narrow band in order to reduce the influence of diffraction and photoelectrons. The exposure determination is based on the measured threshold doses for used SU-8 resist layers as well as on the calculated diffractive distribution of an absorbed power. Post-exposure bake of the resist is performed at low temperature and low pressure to avoid changes of the structural size because of shrinkage due to temperature changes and to eliminate a “skin” layer at the top of the resist. SU8 structures with lateral dimensions of 1 μm and heights from 50 to 80 μm have been fabricated defect free with the optimized process.