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A nano-metrology system with a two-dimensional combined optical and X-ray interferometer and an atomic force microscope

机译:具有二维光学和X射线干涉仪以及原子力显微镜的纳米计量学系统

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摘要

A two-dimensional nano-scale measuring system utilizing a two-dimensional combined optical and X-ray interferometer (2D COXI) was developed for the standardization of measurement in the nanometer region. The system consists of a 2D COXI and an atomic force microscope (AFM). The designed, two-dimensional, flexure-stage scans and the cantilever tip probes the nano-structure of the specimen. The calibrated optical interferometers in the 2D COXI were used to measure two-dimensional nano-scale lengths. The accuracy of the optical interferometers was enhanced to enable sub-nanometer measurements. To demonstrate the nano-scale measuring system, we used it to measure the nano-scale pitches of gratings.
机译:开发了利用二维光学和X射线干涉仪(2D COXI)组合的二维纳米级测量系统,用于纳米区域的测量标准化。该系统由2D COXI和原子力显微镜(AFM)组成。设计的二维挠曲阶段扫描和悬臂式尖端探测了样品的纳米结构。二维COXI中的校准光学干涉仪用于测量二维纳米级长度。光学干涉仪的精度得到了增强,可以进行亚纳米级的测量。为了演示纳米级测量系统,我们使用它来测量光栅的纳米级间距。

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  • 来源
    《Microsystem Technologies》 |2009年第12期|1879-1884|共6页
  • 作者单位

    Manufacturing Engineering Center Samsung Electro-Mechanics Co. Ltd Maetan3-dong Yeongtong-gu Suwon Gyeonggi-do Republic of Korea;

    Department of Mechanical Engineering Korea University Anam-dong Sungbuk-ku Seoul 136-713 Republic of Korea;

    School of Mechanical Engineering Yeungnam University 214-1 Dae-dong Gyeongsan-si Gyeongsangbuk-do 712-749 Republic of Korea;

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