Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals

摘要

The deterministic fabrication of microscopic structures in self-assembled three-dimensional (3D) photonic crystals is reported. Microscopic 1 μm deep controlled structures, cavities with width as small as 5 μm and trenches as narrow as 2 μm, were fabricated using direct electron-beam writing on a poly(methyl methacrylate) (PMMA) opal film. The technique is highly accurate, versatile and is probably suitable to fabricate buried defects.