首页> 外文期刊>Microelectronic Engineering >Evaluation of electrical and optical properties of indium tin oxide thin film using chemical mechanical polishing technique
【24h】

Evaluation of electrical and optical properties of indium tin oxide thin film using chemical mechanical polishing technique

机译:用化学机械抛光技术评估氧化铟锡薄膜的电学和光学性能

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

In this study, the optimum process parameters and the influences of their process parameters were investigated for indium tin oxide-chemical mechanical polishing (ITO-CMP) with the sufficient removal rate and the good planarity. And then, the optical property such as transmittance and absorption efficiency, and the electrical characteristics such as sheet resistance, carrier density and Hall mobility were discussed in order to evaluate the possibility of CMP application for the organic light emitting display (OLED) device using an ITO film. Light transmission efficiency and current-voltage characteristics of ITO thin film were improved after CMP process using optimized process parameters compared to that of as-deposited thin film before CMP process.
机译:在本研究中,研究了具有足够去除率和良好平面性的氧化铟锡化学机械抛光(ITO-CMP)的最佳工艺参数及其工艺参数的影响。然后,讨论了光学特性(例如透射率和吸收效率)以及电特性(例如薄层电阻,载流子密度和霍尔迁移率),以评估将CMP应用于使用OLED的有机发光显示(OLED)器件的可能性。 ITO膜。与CMP工艺之前沉积的薄膜相比,采用优化工艺参数改善了CMP工艺之后ITO薄膜的透光效率和电流-电压特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号