The effect of Si addition and Ta diffusion barrier on growth and thermal stability of NiSi nanolayer

摘要

Formation and thermal stability of nanothickness NiSi layer in Ni(Pt 4 at.%)/Si(100) and Ni_(0.6)Si_(0.4)(Pt 4 at.%)/Si(100) structures have been investigated using magnetron co-sputtering deposition method. Moreover, to study the effect of Si substrate in formation of NiSi and its thermal stability, we have used Ta diffusion barrier between the Ni_(0.6)Si_(0.4) layer and the Si substrate. Post annealing treatment of the samples was performed in an N_2 environment in a temperature range from 200 to 900 ℃ for 2 min. The samples were analyzed by four point probe sheet resistance (R_s) measurement, X-ray diffraction (XRD) and atomic force microscopy (AFM) techniques. It was found that the annealing process resulted in an agglomeration of the nanothickness Ni(Pt) layer, and consequently, phase formation of discontinuous NiSi grains at the temperatures greater than 700 ℃ Instead, for the Ni_(0.6)Si_(0.4)(Pt)/Si structure, 100 ℃ excess temperature in both NiSi formation and agglomeration indicated that it can be considered as a more thermally stable structure as compared with the Ni(Pt 4 at.%)/Si(100) structure. XRD, AFM and R_s analyses confirmed formation of a continuous NiSi film with R_s value of 5 Ω/□ in a temperature range of 700—800 ℃. Use of Ta diffusion barrier showed that the role of diffusion of Ni atoms into the Si substrate is essential in complete silicidation of a NiSi layer. `