SLM device for 193 nm lithographic applications

摘要

The imaging capability of a new spatial light modulator, (SLM), a custom MEMS device is presented. Low k_1 factor aerial image measurements show the suitability of the SLM device for a variety of uses including optical masldess lithography (OML) applications.rnCollaborating with ASML partner companies, a fully programmable 11-million micro-mirror SLM device was designed, fabricated, and tested. Innovative MEMS manufacturing techniques were developed to fabricate the very large number of micro-mirrors on the underlying mixed-signal CMOS control circuitry. The individual eight-micron square mirrors were designed to support conventional, attenuated, and alternating phase-shift lithography.