Extraction of the point-spread function in electron-beam lithography using a cross geometry

摘要

For high-quality dose corrections an accurate knowledge of the dose distribution of a single spot, the point-spread function (psf), is required. Usually this information is obtained by writing a set of parallel lines of variable separation and dosage. Subsequent analysis gives information about the value of the psf as a function of the chosen separation. Here we present an alternative method to extract the psf at arbitrary separation and to a high degree of accuracy. This is based upon the exposure of a cross shaped geometry, in which all relevant separations are present.