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首页> 外文期刊>Microelectronic Engineering >Barrier height temperature coefficient in ideal Ti/n-GaAs Schottky contacts
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Barrier height temperature coefficient in ideal Ti/n-GaAs Schottky contacts

机译:理想的Ti / n-GaAs肖特基接触中的势垒高度温度系数

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摘要

We have measured the I-V characteristics of Ti/n-GaAs Schottky barrier diodes (SBDs) in the temperature range of 60-320 K by the steps of 20 K. The SBDs have been prepared by magnetron DC sputtering. The ideality factor n of the device has remained almost unchanged between 1.02 and 1.04 from 120 to 320 K, and 1.10 at 100 K. Therefore, it has been said that the experimental I-V data are almost independent of the sample temperature and quite well obey the thermionic emission (TE) model at temperatures above 100 K. fuerthermore, the barrier height (BH) Φ_(b0) slightly increased with a decrease in temperature, 320-120 K. The Φ_(b0) versus temperature plot from intercepts of the forward-bias In I versus V curves has given a BH temperature coefficient of α= -0.090 meV/K. The Norde's function has been easily carried out to determine the temperature-dependent series resistance values because the TE current dominates in the I-V characteristics. Therefore, the Φ_(b0) versus temperature plot from the Norde's function has also given a BH temperature coefficient value of α = -0.089 meV/K. Thus, the negligible temperature dependence or BH temperature coefficient close to zero has been attributed to interface defects responsible for the pinning of the Fermi level because their ionization entropy is only weakly dependent on the temperature.
机译:我们已经以20 K的步长在60-320 K的温度范围内测量了Ti / n-GaAs肖特基势垒二极管(SBD)的I-V特性。这些SBD是通过磁控DC溅射制备的。从120到320 K,器件的理想因数n在1.02和1.04之间保持不变,而在100 K时,器件的理想因数n保持在1.10之间。因此,据说实验IV数据几乎与样品温度无关,并且很好地遵守了温度超过100 K时的热电子发射(TE)模型。此外,势垒高度(BH)Φ_(b0)随着温度降低320-120 K而略有增加。Φ_(b0)与温度的关系图来自前向截距I与V的-bias曲线给出的BH温度系数为α= -0.090 meV / K。由于TE电流在I-V特性中占主导地位,因此可以轻松执行Norde函数来确定与温度有关的串联电阻值。因此,根据诺德函数得到的Φ_(b0)与温度的关系曲线也给出了BH温度系数值α= -0.089 meV / K。因此,可以忽略的温度依赖性或接近零的BH温度系数归因于造成费米能级钉扎的界面缺陷,因为它们的电离熵仅弱地依赖于温度。

著录项

  • 来源
    《Microelectronic Engineering》 |2010年第9期|P.1781-1784|共4页
  • 作者单位

    Sueleyman Demirel University, Faculty of Sciences and Arts, Department of Physics, Isparta, Turkey;

    rnDepartment of Physics, Faculty of Sciences and Arts, Bingoel University, Bingoel, Turkey;

    rnAgri Ibrahim Cecen University, Faculty of Sciences and Arts, Department of Physics, Agri, Turkey;

    rnSueleyman Demirel University, Faculty of Sciences and Arts, Department of Physics, Isparta, Turkey;

    rnDepartment of Physics, Faculty of Sciences, Ataturk University, 25240 Erzurum, Turkey;

    rnSueleyman Demirel University, Faculty of Sciences and Arts, Department of Physics, Isparta, Turkey;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    schottky diodes; thermionic emission; norde's function; GaAs; barrier height;

    机译:肖特基二极管;热电子发射;诺德函数砷化镓;障碍高度;

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