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Schottky Barrier Height Inhomogeneity-Induced Deviation From Near-Ideal Pd/InAlN Schottky Contact

机译:肖特基势垒高度不均一引起的与理想Pd / InAlN肖特基接触的偏离

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摘要

A Pd/InAlN Schottky diode with leakage current as low as $hbox{1.01} times hbox{10}^{-6} hbox{A/cm}^{2}$ at $-$5 V at 300 K has been fabricated. It is found that the current–voltage ($I$ –$V$) characteristics of Pd/InAlN Schottky contact can be quantitatively described by taking into account the inhomogeneity of Schottky barrier height (SBH), and the SBH inhomogeneity is the main cause for the significant deviation from an ideal Schottky contact. The SBH inhomogeneity is suggested to be related to the quantum dotlike structure on InAlN surface, indicating the importance of surface effect to the investigations on those devices involving InAlN-based Schottky contact.
机译:制作了Pd / InAlN肖特基二极管,在300 K时,漏电流低至$ hbox {1.01}乘以hbox {10} ^ {-6} hbox {A / cm} ^ {2} $,漏电流低至$-$ 5V。研究发现,Pd / InAlN肖特基接触的电流-电压($ I $ – $ V $)特性可以通过考虑肖特基势垒高度(SBH)的不均匀性来定量描述,而SBH的不均匀性是主要原因与理想的肖特基接触有很大的偏差。 SBH不均匀性被认为与InAlN表面上的量子点状结构有关,这表明表面效应对于研究那些涉及基于InAlN的肖特基接触的器件非常重要。

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