首页> 外文期刊>Japanese journal of applied physics >Electrical characteristics of n-GaN Schottky contacts on cleaved surfaces of free-standing substrates: Metal work function dependence of Schottky barrier height
【24h】

Electrical characteristics of n-GaN Schottky contacts on cleaved surfaces of free-standing substrates: Metal work function dependence of Schottky barrier height

机译:独立衬底劈裂表面上的n-GaN肖特基接触的电特性:肖特基势垒高度对金属功函数的依赖性

获取原文
获取原文并翻译 | 示例
       

摘要

We report the electrical characteristics of Schottky contacts with nine different metals (Ag, Ti, Cr, W, Mo, Au, Pd, Ni, and Pt) formed on clean m-plane surfaces by cleaving freestanding GaN substrates, compared with these of contacts on Ga-polar c-plane n-GaN surfaces grown on GaN substrates. The n-values from the forward current-voltage (I-V) characteristics are as good as 1.02-1.18 and 1.02-1.09 for the m-and c-plane samples, respectively. We found that the reverse I-V curves of both samples can be explained by the thermionic field emission theory, and that the Schottky barrier height of the cleaved m-plane contacts shows a metal work function dependence. (c) 2018 The Japan Society of Applied Physics.
机译:我们报告了通过分裂独立的GaN衬底在干净的m平面表面上形成的九种不同金属(Ag,Ti,Cr,W,Mo,Au,Pd,Ni和Pt)的肖特基接触的电特性,与这些接触相比在生长在GaN衬底上的Ga极c平面n-GaN表面上。对于m平面和c平面样本,正向电流-电压(I-V)特性的n值分别高达1.02-1.18和1.02-1.09。我们发现,两个样品的反向I-V曲线可以通过热电子场发射理论来解释,并且分裂的m平面接触的肖特基势垒高度显示出金属功函数的依赖性。 (c)2018年日本应用物理学会。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号