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首页> 外文期刊>Microelectronic Engineering >A novel chip-to-wafer (C2W) three-dimensional (3D) integration approach using a template for precise alignment
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A novel chip-to-wafer (C2W) three-dimensional (3D) integration approach using a template for precise alignment

机译:一种新颖的芯片到晶片(C2W)三维(3D)集成方法,使用模板进行精确对准

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摘要

This paper reports a novel chip-to-wafer (C2W) three-dimensional (3D) integration approach using a template for precise alignment. The key unit process steps, including template fabrication, chip edge definition, C2W alignment and bonding, are investigated. To demonstrate this C2W approach, benzocyc-lobutene (BCB) and Cu are selected as the starting materials for template and bonding, respectively. Wafers with Cu daisy chains are fabricated for both the chip and host wafer. Individual chips are produced by a 2-step process: defining the chip edges and dicing. All individual chips are aligned to the host wafer with a BCB template, followed by a wafer-level Cu-Cu bonding process. An alignment accuracy of approximately 2 μm is achieved and a good Cu-Cu bond interface is observed with Cu grain-growth across the bonding interface. This C2W 3D integration approach has the potential for low cost and high throughput fabrication of multi-layer high-performance 3D systems.
机译:本文报告了一种新颖的芯片对晶圆(C2W)三维(3D)集成方法,该方法使用模板进行精确对准。研究了关键单元的工艺步骤,包括模板制造,芯片边缘定义,C2W对准和键合。为了证明这种C2W方法,分别选择了苯并环-丁烯(BCB)和Cu作为模板和键合的起始材料。为芯片和主体晶圆都制造了具有铜菊花链的晶圆。单个芯片通过两步过程生产:定义芯片边缘和切块。所有单个芯片都通过BCB模板与主晶圆对齐,然后进行晶圆级Cu-Cu键合工艺。达到大约2μm的对准精度,并且观察到良好的Cu-Cu键界面,且Cu晶粒在键合界面上生长。这种C2W 3D集成方法具有低成本和高吞吐量制造多层高性能3D系统的潜力。

著录项

  • 来源
    《Microelectronic Engineering》 |2012年第4期|p.15-18|共4页
  • 作者单位

    Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA,Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA;

    Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA;

    Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA;

    Tezzaron Semiconductor Corporation, Naperville, IL 60563, USA;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    chip-to-wafer (C2W); three-dimensional (3D) integration; precise alignment; BCB template; Cu-Cu bonding;

    机译:芯片到晶圆(C2W);三维(3D)集成;精确对准;BCB模板;铜铜键;

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