机译:用于通过氢氟酸蒸气蚀刻释放正面MEMS的非晶态含氟聚合物保护涂层
Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan;
Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan;
Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan;
Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan;
Hydrofluoric acid vapor; Front-side release; Amorphous fluoropolymer; Protective coating;
机译:使用气相无水氢氟酸和臭氧进行氧化物蚀刻和晶圆清洗的表征
机译:推荐的用于氢氟酸清洗和蚀刻的个人防护设备
机译:树脂与长石陶瓷的微拉伸粘合强度:氢氟酸蚀刻与摩擦化学二氧化硅涂层。
机译:MEMS释放刻蚀过程中用于氢氟酸蒸气刻蚀的新型聚合物保护涂层
机译:一维硅纳米线的细胞响应以及在纳米线生长之前用氢氟酸蚀刻硅(111)基板的效果。
机译:硅烷热处理可消除锂硅酸锂覆盖的氢氟酸蚀刻:为期四年的随访
机译:通过气相氢氟酸蚀刻法确定单个碳纳米管精确位置的高通量途径
机译:用于聚合物的反应性沉积氧化铝和含氟聚合物填充氧化铝保护涂层